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Failure Analysis Tools & Precision Equipment
About SUNYOU (Sanyu Seisakusho)
SUNYOU (Sanyu Seisakusho Co., Ltd.) is a manufacturing company headquartered in Hitachiota, Ibaraki, Japan. Its core business is the development and manufacture of polishing equipment and plasma etching systems for semiconductor failure analysis, with an integrated production system spanning design, machining, and assembly.
ATE Service Corporation handles product introductions, selection, and deployment consultations for SUNYOU's semiconductor failure-analysis products. Please check the SUNYOU official website for the latest product information.
Polishing
Polishing Equipment
Mechanical package opening and polishing, including localized layer exposure.
DG300
Localized Semiconductor Device Polisher
Creates a localized, bowl-shaped depression by dimple grinding to help expose layers in semiconductor devices.
- Integrated microscope for on-the-spot adjustment and inspection
- Localized polishing with a rotating sample stage and wheel
- Sample preparation for semiconductor failure analysis and materials research
Product Details & Resources ↗Manufacturer website (Japanese)
AP-1000
Precision Polishing System
Handles semiconductor package opening as well as subsequent milling and polishing.
- Accommodates wafers up to 4 inches
- Select processing positions and areas using camera images
- Automatic tilt correction and processing recipe storage and recall
Product Details & Resources ↗Manufacturer website (Japanese)
Plasma Etching
Plasma Etching Systems
Solutions for localized processing, sample preparation, and Minimal Fab etching.
TP-50B
Benchtop Plasma Etching System
Uses suction plasma for applications ranging from exposing interconnects in failure-analysis samples to surface modification and cleaning.
- Localized plasma processing from 0.5 mm in diameter
- Direct removal of reaction products helps reduce residue
- Stage movement enables processing over larger areas
Product Details & Resources ↗Manufacturer website (Japanese)
Minimal Fab
Minimal Micro-Plasma Etching System
A general-purpose etcher incorporating micro-plasma technology for Minimal Fab systems using half-inch wafers.
- Stable plasma generation with a compact, low-power supply
- Supports multiple processing steps
- XY scanning helps achieve uniform etching across the wafer
Product Details & Resources ↗Manufacturer website (Japanese)
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